Professor Rohan Akolkar
Case Western Reserve University
Cleveland, Ohio, USA.
Electrochemical Atomic Layer Deposition and Etching – Novel Processes for Atomically Precise Tailoring of Semiconductor Interconnect Materials in Advanced Integrated Circuits
Many important technological applications, including nano-electronics and advanced integrated circuits, critically depend on the ability to fabricate materials with precise, atomic-level control over structure and properties. Traditionally, fabrication of atomic-scale materials has been achieved through vapor-phase atomic layer deposition (ALD); however, this process has several drawbacks such as the use of unstable precursors which decompose yielding contaminated deposits. An alternative electrochemical approach, using liquid-phase precursors and electrode potential manipulation, termed electrochemical atomic layer deposition (e-ALD) will be outlined in this talk. In this e-ALD approach, underpotential deposition first forms a monolayer of a sacrificial metal such as zinc (Zn). The Zn adlayer then undergoes spontaneous surface-limited redox replacement by a nobler metal such as Cu or Co. This sequence is repeated to build multi-layered metal (Cu or Co) deposits one atomic layer at a time. Unlike vapor-phase ALD, e-ALD uses benign and stable precursors providing high-purity deposits. Furthermore, optimized electrode potential pulsing sequences enable high-throughput, low-cost and scalable fabrication of materials relevant to the metallization of advanced semiconductor devices. Early embodiments of electrochemical atomic layer etching (e-ALE), in which atomic layer-by-layer etching of metals is possible, will also be discussed.
ABOUT THE PRESENTER
Rohan Akolkar is presently the F. Alex Nason Associate Professor (Chemical and Biomolecular Engineering) and Ohio Eminent Scholar at Case Western Reserve University in Cleveland, Ohio, USA. His expertise and research interests include electrochemistry and electrochemical engineering, electrodeposition, electrometallurgy, electro-nucleation and dendrite growth, and electrochemical materials fabrication. His research is funded by federal and industrial sponsors including the US Department of Energy, the National Science Foundation, Atotech, Medtronic, Lam Research, among others. His research has been recognized by the Case School of Engineering Research Award, the prestigious Norman Hackerman Young Author Award of the Electrochemical Society, and numerous industry awards during his 8-year tenure (2005-2012) in R&D at Intel Corporation. He is a member of the Electrochemical Society, the International Society of Electrochemistry, and the Minerals, Metals and Materials Society. He holds a PhD in Chemical Engineering also from Case Western Reserve University (2004).
DATE: Wednesday, 12 April 2017
VENUE: MSG-025 MSSI Building Extension
TEA/COFFEE WILL BE AVAILABLE AT 11h45
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